Ion-beam mixing of Fe/Si bilayers

Milinovic, Velimir

dc.contributor.advisor	Lieb, Klaus-Peter Prof. Dr.	de
dc.contributor.author	Milinovic, Velimir	de
dc.date.accessioned	2006-02-17T15:34:12Z	de
dc.date.accessioned	2013-01-18T13:40:12Z	de
dc.date.available	2013-01-30T23:51:11Z	de
dc.date.issued	2006-02-17	de
dc.identifier.uri	http://hdl.handle.net/11858/00-1735-0000-0006-B585-1	de
dc.identifier.uri	http://dx.doi.org/10.53846/goediss-2887
dc.description.abstract	Die vorliegende Arbeit beschreibt Veränderungen der strukturellen und magnetischen Eigenschaften von Fe/Si-Doppelschichten nach dem Beschuss mit schweren Ionen (14N, 40Ar, 84Kr, 132Xe, 197Au). Im Vergleich zu anderen Arbeiten, die sich hauptsächlich mit dem Beschuss durch niedrig geladene Edelgasionen bei einigen 100 keV beschäftigen, werden hier verschiedene Nicht-Standard -Implantationsbedingungen betrachtet. Diese sind: (1)der Beschuss mit chemisch aktiven Ionen (i.e. Stickstoff), der zur Bildung von Eisennitridphasen führt. (2)Beobachtungen zum Einfluss der Ionenladung bei Edelgasen und zum Einfluss der Vorimplantation von Ar+-Ionen niedriger Energie. (3)Experimente mit schnellen und schweren Ionen am Beispiel von 350 MeV 197Au26+-Ionen.	de
dc.format.mimetype	application/pdf	de
dc.language.iso	eng	de
dc.rights.uri	http://webdoc.sub.gwdg.de/diss/copyr_diss.html	de
dc.title	Ion-beam mixing of Fe/Si bilayers	de
dc.type	doctoralThesis	de
dc.title.translated	Ionenstrahkmischen von Fe/Si Dopelschichten	de
dc.contributor.referee	Rizzi, Angela Prof. Dr.	de
dc.date.examination	2005-10-27	de
dc.subject.dnb	530 Physik	de
dc.description.abstracteng	The present study focuses on the changes in the structural and magnetic properties in Fe/Si bilayers induced by heavy-ion irradiation (14N, 40Ar, 84Kr, 132Xe, 197Au). With respect to previous work, in which mainly noble-gas ions of low charge state and several hundred keV energy were investigated, several "non-standard" implantation conditions were considered: (1) The use of chemically active ions such as nitrogen demonstrated the competition between nitride formation and ion beam mixing at the interface. During implantation only iron nitrides were formed; even at the highest nitrogen fluence no silicides were formed. (2) For several noble-gas ions, the effects of ion charge and low-energy Ar+ pre-implantation into the Si wafers were studied. While the interface mixing rate does not depend on the ion charge, pre-amorphization of the Si wafer enhances the mixing rate by a factor 2. (3) Finally, experiments were conducted for swift 350 MeV 197Au26+ ions to measure the mixing rate and the magnetic anisotropy in the regime of electronic stopping. A very high mixing rate of 55(5) nm4 was found and attributed to thermal spikes due to the very high energy density of about 40 keV/nm deposited in the Fe/Si couple.	de
dc.subject.topic	Mathematics and Computer Science	de
dc.subject.ger	Ionenbestrahlung	de
dc.subject.ger	schnellen und schweren Ionen	de
dc.subject.ger	Mischrate	de
dc.subject.ger	dünne Eisenfilme	de
dc.subject.ger	RBS	de
dc.subject.ger	CEMS	de
dc.subject.ger	MOMS	de
dc.subject.eng	ion irradiation	de
dc.subject.eng	swift heavy ion irradiation	de
dc.subject.eng	mixing rate	de
dc.subject.eng	thin Fe films	de
dc.subject.eng	RBS	de
dc.subject.eng	CEMS	de
dc.subject.eng	MOMS	de
dc.subject.bk	33.05	de
dc.subject.bk	33.61	de
dc.subject.bk	33.68	de
dc.identifier.urn	urn:nbn:de:gbv:7-webdoc-662-2	de
dc.identifier.purl	webdoc-662	de
dc.affiliation.institute	Fakultät für Physik	de
dc.subject.gokfull	RVT 500: Bestrahlungseffekte in Metallen {Physik}	de
dc.identifier.ppn	512767041	de

Files in this item

Name:milinovic.pdf

Size:1.996Mb

Format:PDF

Description:Dissertation

View/Open

Name:: milinovic.pdf
Size:: 1.996Mb
Format:: PDF
Description:: Dissertation

View/Open

This item appears in the following Collection(s)

Fakultät für Physik (inkl. GAUSS) [952]

Show simple item record